Your Tasks
As part of an international collaboration investigating ferroelectric field effect transistor technologies, you will:
- Develop a fundamental understanding of how process parameters in pulsed laser deposition translate into the composition of complex oxide thin films and ultimately into their functionality.
- Identify and investigate material compositions relevant to the technology.
- Be responsible for a pulsed laser deposition chamber utilizing highly unique in situ characterization techniques to achieve these goals.
- Develop strategies, including machine learning algorithms, to enhance the reproducibility of the grown films using in situ techniques during the growth process.
- Employ the collected data to publish peer-reviewed articles.
Your Profile
- Master's degree or equivalent in materials science, chemistry, physics, or a related discipline.
- Foundational knowledge of the physics and/or chemistry of laser-induced plasmas.
- Understanding of physical vapor deposition and vacuum infrastructure, development of electronic or mechanical components for vacuum chambers, and proficiency in Python are considered advantageous.
- A communicative and team-oriented profile, who enjoys working in an interdisciplinary research environment.
- Professional proficiency in written and spoken English is required; knowledge of German is an asset.
We Offer
Our institution is rooted in an interdisciplinary, innovative, and dynamic collaboration. You will benefit from systematic on-the-job training, along with opportunities for personal development and a strong emphasis on vocational training culture. If you wish to optimally balance work and family life or other personal interests, we are equipped to support you with modern employment conditions and on-site infrastructure.
You will be enrolled in the Doctoral program at ETH Zürich, through which you will earn your PhD title.
Apply online using the form below. Only applications matching the job profile will be considered.
Work locationVilligen PSI, Switzerland