100%, Zurich, fixed-term
The Nonlinear Optics for Epitaxial Growth of Advanced Thin Films (NEAT) laboratory, part of the Institute of Multifunctional Ferroic Materials within the Materials Department, is seeking PhD candidates. Our focus is on the epitaxial deposition of functional oxide thin films using pulsed laser deposition. We employ in-situ diagnostic tools during the growth process to enhance the design of technologically relevant oxide thin films. Our unique combination of state-of-the-art nonlinear optics monitoring and electron spectroscopy in situ enables us to investigate the dynamics of the functional properties from the very first unit cell. Our research aims to understand the evolution of physical properties of epitaxial thin films in the ultrathin regime and to explore interface-related phenomena in multilayers.
Ferroelectric transition metal oxides offer a diverse array of functionalities. In thin-film form, their potential applications include low-energy-consuming, electric-field-controllable non-volatile memory elements with high information density. Recent advancements in controlling electrostatic and elastic boundary conditions in thin film superlattices, along with the manipulation of interface physical properties, have enabled the design of more complex electric dipole orderings such as polar vortices or skyrmions, thereby broadening the applications of ferroelectric materials.
Unlike the conventional depolarizing-field tuning approach, an increasing number of studies report on the influence of spontaneously forming charged off-stoichiometric surface layers affecting the polarization state of ferroelectric thin films. The PhD project will leverage our leading international expertise in oxide thin film growth and nonlinear laser spectroscopy. We aim to pioneer the use of charged surface layers as polarizing sheets in our functional heterostructures, establishing innovative routes for nanoscale electrostatic control in ferroelectric thin films through lattice chemistry.
The doctoral project’s goal is to explore how lattice chemistry, including charged off-stoichiometric layers and chemical variations in layered compounds, can provide an additional degree of freedom to manipulate ferroelectric order, standing in contrast to conventional depolarizing-field tuning strategies. By utilizing our unique capability to engineer oxide thin film interfaces with atomic precision, in conjunction with our state-of-the-art non-invasive optical probe of polarization in thin films, we will advance surface chemistry exploitation in oxide ferroelectric thin films. Additional structural and functional characterization tools, including scanning probe microscopy, X-ray diffraction, and transmission electron microscopy, will also be employed.
Our research will lay the groundwork for alternative design strategies for epitaxial oxide multilayers featuring naturally forming, polarizing electrostatic boundary conditions, thus advancing the engineering of technology-relevant chiral polar, magnetic, and magnetoelectric textures.
Our in-situ monitoring capacity of polarization during both growth and optical poling is unparalleled globally. This PhD project offers significant opportunities for exciting physics and groundbreaking discoveries, supported by our lab’s exceptional expertise. Intense collaboration with specialists in electron microscopy, magnetic characterization, and nitrogen vacancy scanning electrometry enables a multiscale approach.
Candidates will join our international NEAT research team of highly motivated PhD and Master's students, utilizing our facilities for thin film growth and characterization with nonlinear laser spectroscopy. They will have the opportunity to design and set up their own experiments, with the freedom to pivot and explore new approaches as needed. While the primary focus will be on thin-film growth experiments, involvement with other experimental techniques and discussions with theoretical groups is encouraged.
Our lab provides outstanding facilities with pulsed laser deposition chambers, femtosecond and nanosecond laser systems, and an international atmosphere of mutually supportive colleagues. We maintain a flat hierarchy where every opinion is valued in scientific discussions. Enjoy excellent working conditions along with an internationally competitive salary, plus support for attending international conferences and workshops. Benefit from an extensive network of scientific collaborators and access to the exceptional technological infrastructure of ETH Zurich.
ETH Zurich promotes an inclusive culture, encouraging equality of opportunity and valuing diversity. Our working and learning environments respect the rights and dignity of all staff and students. For more information, visit our Equal Opportunities and Diversity webpage.
Apply online using the form below. Only applications matching the job profile will be considered.
For further information, please visit our website. For questions regarding the position, contact Prof. Morgan Trassin at Show e-mail.ch">. Selection will commence immediately, so early submissions are encouraged.
ETH Zurich is among the world's leading universities specializing in science and technology. We are celebrated for our exceptional education, groundbreaking fundamental research, and the direct transfer of new knowledge into society. With over 30,000 members from more than 120 countries, our university fosters independent thinking and inspires excellence. Located in the heart of Europe and establishing connections globally, we collaboratively develop solutions for the pressing challenges of today and tomorrow.
Location : Zürich
Country : Switzerland